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Volumn , Issue , 2011, Pages 348-351

Wafer-level integration of niti shape memory alloy wires for the fabrication of microactuators using standard wire bonding technology

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE DEVIATION; MECHANICAL CLAMPING; NITI SHAPE MEMORY ALLOYS; SILICON STRUCTURES; SILICON-BASED MEMS; SMA WIRE; WAFER-LEVEL INTEGRATION; WIRE BONDING TECHNOLOGY; WIREBONDER;

EID: 79953794837     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2011.5734433     Document Type: Conference Paper
Times cited : (12)

References (11)
  • 2
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    • K. Skrobanek et al.: "Stress-optimized shape memory mi-crovalves", MEMS Proc., pp. 256-261, (1997)
    • (1997) MEMS Proc. , pp. 256-261
    • Skrobanek, K.1
  • 4
    • 71549121618 scopus 로고    scopus 로고
    • Development of high-speed microac-tuators utilizing sputterdeposited TiNi-base shape memory alloy thin films
    • S. Miyazaki et al.: "Development of high-speed microac-tuators utilizing sputterdeposited TiNi-base shape memory alloy thin films", Actuator Proc., pp.372-377 (2008)
    • (2008) Actuator Proc. , pp. 372-377
    • Miyazaki, S.1
  • 5
    • 77955414734 scopus 로고    scopus 로고
    • Design and wafer-level fabrication of SMA wire microactuators on silicon
    • D. Clausi et al.: "Design and wafer-level fabrication of SMA wire microactuators on silicon", JMEMS, vol. 19, no. 4 (2010)
    • (2010) JMEMS , vol.19 , Issue.4
    • Clausi, D.1
  • 7
    • 0035922148 scopus 로고    scopus 로고
    • Instrumented micro-indentation of NiTi shape-memory alloys
    • DOI 10.1016/S1359-6454(01)00223-3, PII S1359645401002233
    • K. Gall et al.: "Instrumented micro-indentation of NiTi shape-memory alloys", Acta Materialia, vol. 49, no. 16, pp. 3205-3217 (2001) (Pubitemid 32768116)
    • (2001) Acta Materialia , vol.49 , Issue.16 , pp. 3205-3217
    • Gall, K.1    Juntunen, K.2    Maier, H.J.3    Sehitoglu, H.4    Chumlyakov, Y.I.5
  • 8
    • 34247505036 scopus 로고    scopus 로고
    • A method for tapered deep reactive ion etching using a modified Bosch process
    • DOI 10.1088/0960-1317/17/5/031, PII S0960131707439997, 031
    • N. Roxhed et al.: "A method for tapered deep reactive ion etching using a modified Bosch process", JMM, vol. 17, pp. 1087-1092, (2007) (Pubitemid 46656164)
    • (2007) Journal of Micromechanics and Microengineering , vol.17 , Issue.5 , pp. 1087-1092
    • Roxhed, N.1    Griss, P.2    Stemme, G.3
  • 9
    • 79953789149 scopus 로고    scopus 로고
    • Wafer-level mechanical and electrical integration of SMA wires to silicon MEMS using electroplating
    • D. Clausi et al.: "Wafer-level mechanical and electrical integration of SMA wires to silicon MEMS using electroplating", MEMS Proc. (2011)
    • (2011) MEMS Proc.
    • Clausi, D.1
  • 10
    • 37649015530 scopus 로고    scopus 로고
    • Characterization of ni-trided/oxidized layers covering NiTi shape memory alloy
    • T. Goryczka et al.: "Characterization of ni-trided/oxidized layers covering NiTi shape memory alloy", Solid State Phenomena, vol. 54, pp. 151-154, (2007)
    • (2007) Solid State Phenomena , vol.54 , pp. 151-154
    • Goryczka, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.