Advances in high rate uncooled detector fabrication at Raytheon

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7660, Issue , 2010, Pages

  Black, S H ^a   Kraft, R ^a   Medrano, A ^a   Kocian, T ^a   Bradstreet, D ^a   Williams, R ^a   Yang, T ^a  

^a RAYTHEON COMPANY   (United States)

Author keywords

Bolometer; Uncooled; Vanadium oxide; VOx

Indexed keywords

AUTOMATED PACKAGING; DEPOSITION EQUIPMENT; DOUBLE LAYERS; FLOOR SPACE; HIGH RATE; LINE CAPACITY; MANUFACTURING CAPABILITY; PACKAGING COSTS; PICK AND PLACE; PROCESS FLOWS; PRODUCTION RATES; QUALIFICATION PROCESS; RAYTHEON; TAKT TIME; TEMPERATURE CHAMBER; UNCOOLED; UNCOOLED DETECTORS; VALUE STREAMS; VANADIUM OXIDES; VOLUME SOURCE; VOX; WAFER FABRICATIONS; WIRE BONDING;

AUTOMATION; BOLOMETERS; CALIBRATION; ECONOMIC ANALYSIS; FABRICATION; INFRARED RADIATION; INVESTMENTS; OXIDES; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; VANADIUM; VANADIUM ALLOYS; VANADIUM COMPOUNDS;

INFRARED DETECTORS;

EID: 79953715685     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.853675     Document Type: Conference Paper

References (0)