Fabrication of a submicron-channel organic field-effect transistor using a controllable electrospun single fibre as a shadow mask

Nanotechnology

Volumn 22, Issue 20, 2011, Pages

  Ishii, Y ^a   Sakai, H ^a   Murata, H ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE LAYER; ALUMINIUM OXIDE; AVERAGE DIAMETER; CHANNEL LENGTH; ELECTROSPINNING METHOD; ELECTROSPUNS; HIGH UNIFORMITY; LOW VOLTAGES; NARROW GAP; ORDER OF MAGNITUDE; PENTACENES; SHADOW MASK; SUBMICRON; SUBMICRON CHANNELS; SUBTHRESHOLD SWING; ULTRATHIN DIELECTRICS; VERSATILE METHODS;

ELECTRODES; FIBERS; FIELD EFFECT TRANSISTORS; SELF ASSEMBLED MONOLAYERS;

ORGANIC FIELD EFFECT TRANSISTORS;

EID: 79953275007     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/20/205202     Document Type: Article

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