Microwave assisted chemical bath deposited polyaniline films for supercapacitor application

Journal of Alloys and Compounds

Volumn 509, Issue 16, 2011, Pages 5064-5069

  Deshmukh, P R ^a   Pusawale, S N ^a   Jamadade, V S ^a   Patil, U M ^a   Lokhande, C D ^a  

^a SHIVAJI UNIVERSITY   (India)

Author keywords

Chemical synthesis; Microwave assisted chemical bath deposition (MW CBD); Optical properties; Supercapacitive behavior; Thin films; Wettability test

Indexed keywords

CHEMICAL BATH; CHEMICAL SYNTHESIS; CHEMICAL-BATH DEPOSITION; FOURIER TRANSFORM INFRARED; MICROWAVE ASSISTED; MORPHOLOGICAL STUDY; OPTICAL STUDY; POLYANILINE FILM; SCAN RATES; SEM; SPECIFIC CAPACITANCE; STAINLESS STEEL SUBSTRATES; SUBSTRATE SURFACE; SUPERCAPACITIVE BEHAVIOR; SUPERCAPACITOR APPLICATION; UV-VIS SPECTROPHOTOMETERS; VOLTAMMETRIC; WATER CONTACT ANGLE MEASUREMENT; WELL-COVERED; WETTABILITY TEST;

AMORPHOUS FILMS; ANGLE MEASUREMENT; CONTACT ANGLE; DEPOSITION; DIFFRACTION; FOURIER TRANSFORMS; MICROWAVE DEVICES; MICROWAVES; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; STAINLESS STEEL; STOVES; SYNTHESIS (CHEMICAL); THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION;

POLYANILINE;

EID: 79953051715     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.12.009     Document Type: Article

References (45)

1. Y.K. Srivastava Rasayan J. Chem. 1 2008 884
2. R.S. Mane, and C.D. Lokhande Mater. Chem. Phys. 65 2000 1
3. D.P. Dubal, D.S. Dhawale, R.R. Salunkhe, V.J. Fulari, and C.D. Lokhande J. Alloys Compd. 497 2010 166
4. D.P. Dubal, D.S. Dhawale, R.R. Salunkhe, V.S. Jamdade, and C.D. Lokhande J. Alloys Compd. 492 2010 26
5. H. Mi, X. Zhang, S. An, X. Ye, and S. Yang Electrochem. Commun. 9 2007 2859
6. E. Vigil, D. Dixon, J.W.J. Hamilton, and J.A. Byrne Surf. Coat. Technol. 203 2009 3614
7. R. Zhai, S. Wang, H. Xu, H. Wang, and H. Yan Mater. Lett. 59 2005 1497
8. V.R. Shinde, C.D. Lokhande, R.S. Mane, and S.H. Han Appl. Surf. Sci. 245 2005 407
9. V.K. Ivanov, A.S. Shaporev, F.Y. Sharikov, and A.Y. Baranchikov Superlattices Microstruct. 42 2007 421
10. F. Wiesbrock, R. Hoogenboom, and U.S. Schubert Macromol. Rapid Commun. 25 2004 1739
11. V. Khomenko, E. Franckowiak, and F. Beguin Electrochim. Acta 50 2005 2499
12. K.S. Ryu, K.M. Kim, N.G. Park, Y.J. Park, and S.H. Chang J. Power Sources 103 2002 305
13. M.M. Ayad, N. Salahuddin, and M.A. Shenashin Synth. Met. 142 2004 101
14. E. Detsre, and S. Thierry Dubas J. Met. Mater. Miner. 19 2009 39
15. A.B. Afzal, M.J. Akhtar, M. Nadeem, M. Ahmad, M.M. Hassan, T. Yasin, and M. Mehmood J. Phys. D: Appl. Phys. 42 2009 015411
16. S. Sathiyanarayanan, S. Syed Azim, and G. Venkatachari Electrochim. Acta 52 2007 2068
17. C. Zhou, J. Han, G. Song, and R. Guo Macromolecules 40 2007 7075
18. R.C. Ramola, S. Chandra, J.M.S. Rana, R. Sharma, S. Annapoorni, R.G. Sonkawade, F. Singh, and D.K. Avasthi Curr. Sci. 97 2009 1453
19. S. Ivanov, P. Mokreva, V. Tsakova, and L. Terlemezyan Thin Solid Films 441 2003 44
20. R. Mazeikiene, and A. Malinauskas Synth. Met. 108 2000 9
21. D.S. Dhawale, D.P. Dubal, V.S. Jamadade, R.R. Salunkhe, and C.D. Lokhande Synth. Met. 160 2010 519
22. S.S. Joshi, and C.D. Lokhande J. Mater. Sci. 42 2007 1304
23. D.F. Li, W. Wang, H.J. Wang, X.S. Jia, and J.Y. Wang Appl. Surf. Sci. 255 2008 581
24. O. Bockman, T. Ostvold, G.A. Voyiatzis, and G.N. Papatheodorou Hydrometallurgy 55 2000 93
25. R.S. Mane, J. Chang, D. Ham, B.N. Pawar, T. Ganesh, B.W. Cho, J.K. Lee, and S.H. Han Curr. Appl. Phys. 9 2009 87
26. H. Zengin, W. Zhou, J. Jin, R. Czerw, D.W. Smith, J.L. Echegoyen, D.L. Carroll, S.H. Foulger, and J. Ballato Adv. Mater. 14 2002 1480
27. Y. Tan, Y. Zhang, and J. Kan eXPRESS Polym. Lett. 3 2009 333
28. J.J. Lunhong, and L.C. Li J. Mater. Sci. 44 2009 1024
29. M.R. Saboktakin, A. Maharramov, and M.A. Ramazanov Nat. Sci. 5 2007 67
30. A. Tiwari, and V. Singh eXPRESS Polym. Lett. 1 2007 308
31. S.S. Joshi, T.P. Gujar, V.R. Shinde, and C.D. Lokhande Sens. Actuators B 132 2008 349
32. J.N. Broughton, and M.J. Brett Electrochem. Solid State Lett. 5 2002 279
33. D.S. Dhawale, R.R. Salunkhe, V.S. Jamadade, D.P. Dubal, S.M. Pawar, and C.D. Lokhande Curr. Appl. Phys. 10 2010 904
34. V. Gupta, and N. Miura Electrochem. Solid State Lett. 8 2005 630
35. V.S. Jamadade, D.S. Dhawale, and C.D. Lokhande Synth. Met. 160 2010 955
36. T.P. Gujar, W.Y. Kim, I. Puspitasari, K.D. Jung, and O.S. Joo Int. J. Electrochem. Sci. 2 2007 666
37. A. Sezai Sarac, M. Ates, and B. Kilic Int. J. Electrochem. Sci. 3 2008 777
38. G. Arabale, D. Wagh, M. Kulkarni, I.S. Mulla, S.P. Vernekar, K. Vijayymohanan, and A.M. Rao Chem. Phys. Lett. 376 2003 207
39. M.S. Dandekar, G. Arabale, and K. Vijayymohanan J. Power Sources 141 2005 198
40. W.C. Chen, T.C. Wen, and H. Teng Electrochem. Acta 48 2003 641
41. V. Ganesh, S. Pitchumani, and V. Lakshminarayanan J. Power Sources 158 2006 1523
42. X.F. Wang, D.B. Ruan, D.Z. Wang, and J. Liang Acta Phys. Chem. Sin. 21 2005 261
43. F. Pico, J. Ibanez, M.A. Lillo-Rodenas, A. Linares-Solano, R.M. Rojas, J.M. Amarilla, and J.M. Rojo J. Power Sources 176 2008 417
44. S. Richard Prabhu Gnanakan, M. Rajasekhar, and A. Subramania Int. J. Electrochem. Sci. 4 2009 1289
45. K. Prasad, and N. Munichandraiah Electrochem. Solid State Lett. 5 2002 271