Geometry variations analysis of TiO2 thin-film and spintronic memristors

Proceedings of the Asia and South Pacific Design Automation Conference, ASP-DAC

Volumn , Issue , 2011, Pages 25-30

  Hu, Miao ^a   Li, Hai ^a   Chen, Yiran ^b   Wang, Xiaobin ^c   Pino, Robinson E ^d  

^a POLYTECHNIC UNIVERSITY   (United States)

^b UNIVERSITY OF PITTSBURGH   (United States)

^c SEAGATE TECHNOLOGY   (United States)

^d AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL CHARACTERISTIC; ELECTRICAL PROPERTY; GEOMETRY VARIATIONS; LINE EDGE ROUGHNESS; MEMRISTOR; MONTE CARLO SIMULATION; NANOSCALE DEVICE; PASSIVE CIRCUITS; PHYSICAL MECHANISM; PROCESS VARIATION; SIMPLE ALGORITHM; SIMULATION RESULT; SPINTRONICS; SYSTEM DESIGN; THICKNESS FLUCTUATIONS; THREE-DIMENSIONAL DEVICES; TIO;

COMPUTER AIDED DESIGN; ELECTRIC PROPERTIES; GEOMETRY; MEMRISTORS; PASSIVE FILTERS; SYSTEMS ANALYSIS;

RESISTORS;

EID: 79952966334     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASPDAC.2011.5722193     Document Type: Conference Paper

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