Electrodeposition of Te and Cu thin films on boron doped diamond (BDD) electrode

ECS Transactions

Volumn 25, Issue 27, 2009, Pages 209-214

  Fernandes, V C ^a   Matsushima, J T ^b   Baldan, M R ^b   Azevedo, A F ^b   Linardi, M ^a   Ferreira, N G ^b  

^a INSTITUTO DE PESQUISAS ENERGÉTICAS E NUCLEARES   (Brazil)

^b INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

BOOLEAN FUNCTIONS; BORON; CHEMICAL VAPOR DEPOSITION; COPPER; COPPER COMPOUNDS; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; MORPHOLOGY; NANOCOMPOSITE FILMS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; TELLURIUM;

BDD ELECTRODES; BORON-DOPED DIAMOND ELECTRODES; BORON-DOPING; CU THIN FILM; DISSOLUTION PROCESS; ELECTROCHEMICAL BEHAVIORS; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION;

THIN FILMS;

EID: 79952744502     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3318520     Document Type: Conference Paper

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