Electrochemical growth of gold nanostructures for surface-enhanced raman scattering

Journal of Physical Chemistry C

Volumn 115, Issue 5, 2011, Pages 1932-1939

  Yang, Yu Cheng ^a   Huang, Ting Kai ^a   Chen, Yu Liang ^a   Mevellec, Jean Yves ^c   Lefrant, Serge ^c   Lee, Chi Young ^b   Chiu, Hsin Tien ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c UNIVERSITÉ DE NANTES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMICAL DEPOSITION; INDIUM COMPOUNDS; NANOSTRUCTURES; RAMAN SCATTERING; REDUCTION; SUBSTRATES; SURFACE PLASMON RESONANCE; SURFACE SCATTERING; TIN OXIDES;

ELECTROCHEMICAL GROWTH; ENHANCED SCATTERING; EXCITATION WAVELENGTH; FABRICATION PROCESS; FACILE FABRICATION; GOLD NANOSTRUCTURES; INDIUM TIN OXIDE SUBSTRATES; SURFACE ENHANCED RAMAN SCATTERING (SERS);

GOLD;

EID: 79952692788     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp1073544     Document Type: Article

References (45)

1. Adler-Golden, S. M.; Goldstein, N.; Bien, F.; Matthew, M. W.; Gersh, M. E.; Cheng, W. K.; Adams, F. W. Appl. Opt. 1992, 31, 831
2. Fleischman, M.; Hendra, P. J.; McQuillan, A. J. Chem. Phys. Lett. 1974, 26, 163
3. Albrecht, M. G.; Creighton, J. A. J. Am. Chem. Soc. 1977, 99, 5215
4. Jeanmaire, D. L.; Van Duyne, R. P. J. Electroanal. Chem. 1977, 84, 1
5. Moskovits, M. Rev. Mod. Phys. 1985, 57, 783
6. Haynes, C. L.; Van Duyne, R. P. J. Phys. Chem. B 2003, 107, 7426
7. Alvarez-Puebla, R.; Cui, B.; Bravo-Vasquez, J.-P.; Veres, T.; Fenniri, H. J. Phys. Chem. C 2007, 111, 6720
8. Moores, A.; Goettmann, F. New J. Chem. 2006, 30, 1121
9. Jackson, J. B.; Halas, N. J. Proc. Natl. Acad. Sci. U.S.A. 2004, 101, 17930
10. Wang, H.; Levin, C. S.; Halas, N. J. J. Am. Chem. Soc. 2005, 127, 14992
11. Richard, J. C. B.; Martin, J. T. M. J. Raman Spectrosc. 2008, 39, 1313
12. Wang, T.; Hu, X.; Dong, S. J. Phys. Chem. B 2006, 110, 16930
13. Sawai, Y.; Takimoto, B.; Nabika, H.; Ajito, K.; Murakoshi, K. J. Am. Chem. Soc. 2007, 129, 1658
14. Qian, L. H.; Yan, X. Q.; Fujita, T.; Inoue, A.; Chen, M. W. Appl. Phys. Lett. 2007, 90 1531201
15. Duan, G.; Cai, W.; Luo, Y.; Li, Z.; Li, Y. Appl. Phys. Lett. 2005, 89 2119051
16. Schwartzberg, A. M.; Grant, C. D.; Wolcott, A.; Talley, C. E.; Huser, T. R.; Bogomolni, R.; Zhang, J. Z. J. Phys. Chem. B 2004, 108, 19191
17. Billot, L.; Lamy de la Chapelle, M.; Grimault, A. S.; Vial, A.; Barchiesi, D.; Bijeon, J. L.; Adam, P. M.; Royer, P. Chem. Phys. Lett. 2006, 422, 303
18. Tao, A.; Kim, F.; Hess, C.; Goldberger, J.; He, R.; Sun, Y.; Xia, Y.; Yang, P. Nano Lett. 2003, 3, 1229
19. Orendorff, C. J.; Gearheart, L.; Jana, N. R.; Murphy, C. J. Phys. Chem. Chem. Phys. 2006, 8, 165
20. Wang, Z. B.; Luk'yanchuk, B. S.; Guo, W.; Edwardson, S. P.; Whitehead, D. J.; Li, L.; Liu, Z.; Watkins, K. G. J. Chem. Phys. 2008, 128 094705
21. Wu, W.; Hu, M.; Ou, F. S.; Li, Z.; Williams, R. S. Nanotechnology 2010, 21 2555021
22. Huang, T.-K.; Chen, Y.-C.; Ko, H.-C.; Huang, H.-W.; Wang, C.-H.; Lin, H.-K.; Chen, F.-R.; Kai, J.-J.; Lee, C.-Y.; Chiu, H.-T. Langmuir 2008, 24, 5647
23. Wu, H.-L.; Chen, C.-H.; Huang, M. H. Chem. Mater. 2008, 21, 110
24. Kumar, S.; Yang, H.; Zou, S. J. Phys. Chem. C 2007, 111, 12933
25. Murphy, C. J.; Jana, N. R. Adv. Mater. 2002, 14, 80
26. Joint Committee for Powder Diffraction (JCPDS) File No. 04-0784. International Center for Diffraction Data, 1953.
27. Johnson, C. J.; Dujardin, E.; Davis, S. A.; Murphy, C. J.; Mann, S. J. Mater. Chem. 2002, 12, 1765
28. Nikoobakht, B.; El-Sayed, M. A. Chem. Mater. 2003, 15, 1957
29. Nikoobakht, B.; El-Sayed, M. A. Langmuir 2001, 17, 6368
30. Raptis, R. G.; Fackler, J. P. Inorg. Chem. 1990, 29, 5003
31. Xiang, C.; Guell, A. G.; Brown, M. A.; Kim, J. Y.; Hemminger, J. C.; Penner, R. M. Nano Lett. 2008, 8, 3017
32. Trasatti, S.; Petrii, O. A. Real Surface Area Measurements in Electrochemistry Pure Appl. Chem. 1991, 63, 711
33. Choi, C. H.; Kertesz, M. J. Phys. Chem. A 1997, 101, 3823
34. Qin, L.; Zou, S.; Xue, C.; Atkinson, A.; Schatz, G. C.; Mirkin, C. A. Proc. Natl. Acad. Sci. U.S.A. 2006, 103, 13300
35. Chen, C.; Hutchison, J. A.; Clemente, F.; Kox, R.; Uji-I, H.; Hofkens, J.; Lagae, L.; Maes, G.; Borghs, G.; Van Dorpe, P. Angew. Chem. 2009, 121, 10116
36. Lee, S. J.; Morrill, A. R.; Moskovits, M. J. Am. Chem. Soc. 2006, 128, 2200
37. Prokes, S. M.; Alexson, D.; Glembocki, O. J.; Park, H. D.; Rendell, R. W. J. Vac. Sci. Technol., B 2009, 27, 2055
38. Prokes, S. M.; Glembocki, O. J.; Rendell, R. W.; Ancona, M. G. Appl. Phys. Lett. 2007, 90 0931051
39. Jensen, L.; Schatz, G. C. J. Phys. Chem. A 2006, 110, 5973
40. Cai, W.-B.; Wan, L.-J.; Noda, H.; Hibino, Y.; Ataka, K.; Osawa, M. Langmuir 1998, 14, 6992
41. Ru, E. C. L.; Meyer, M.; Blackie, E.; Etchegoin, P. G. J. Raman Spectrosc. 2008, 39, 1127
42. Chen, T.; Wang, H.; Chen, G.; Wang, Y.; Feng, Y.; Teo, W. S.; Wu, T.; Chen, H. ACS Nano 2010, 4, 3087
43. Ru, E. C. L.; Blackie, E.; Meyer, M.; Etchegoin, P. G. J. Phys. Chem. C 2007, 111, 13794
44. D3 Technologies Inc., Klarite The Gold Standard in SERS Substrates. http://www.renishawdiagnostics.com/en/klarite - 12409.
45. Hoogvliet, J. C.; van Bennekom, W. P. Electrochim. Acta 2001, 47, 599