Through-mask electro-etching for fabrication of metal bipolar plate gas flow field channels

ECS Transactions

Volumn 33, Issue 1 PART 1, 2010, Pages 991-1006

  McCrabb, H ^a   Taylor, E J ^a   Lozano Morales, A ^a   Shimpalee, S ^b   Inmana, M ^a   Van Zee, J W ^b  

^a FARADAY TECHNOLOGY INC   (United States)

^b The Department of Mechanical Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIPOLAR PLATES; CELL MANUFACTURING; CHANNEL DEPTH; COMMERCIAL ENERGY; COMMERCIAL MARKET; COST COMPONENTS; DIMENSIONAL ACCURACY; ETCHING PROCESS; GAS FLOW FIELD; HIGH VOLUME MANUFACTURING; MANUFACTURING PROCESS; PATTERN DESIGNS; PEM FUEL CELL; PHOTORESIST MASK; PHOTORESIST PATTERNING; THROUGH-MASK;

ELECTRIC FIELDS; ETCHING; FLOW FIELDS; FLOW OF GASES; FUEL CELLS; GAS FUEL PURIFICATION; INDUSTRIAL ENGINEERING; PHOTORESISTS; PLATE METAL; POLYELECTROLYTES; PRODUCTION ENGINEERING; STAINLESS STEEL;

MANUFACTURE;

EID: 79952662405     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3484593     Document Type: Conference Paper

References (5)

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3. L. Gebhart, J. Sun, P. Miller, E.J. Taylor "Electroplating cell with hydrodynamics facilitating more uniform deposition across a workpiece during plating", U.S. Patent No. 7,553,401 issued June 30, 2010.
4. H. McCrabb, A. Lozano-Morales, S. Snyder, L. Gebhart, E.J. Taylor, "Through Mask Electrochemical Machining" ", ECS Trans. 19 (26), 19 (2009).
5. A. Lozano-Morales, H. McCrabb, E. J. Taylor, A. C. West, "Variation of counterelectrode size to control current distribution in parallel plate cells", Manuscript submitted, J. Appl. Surf. Finish., (2007).