Lowering the synthesis temperature of Ni2P/SiO2 by palladium addition

Journal of Catalysis

Volumn 279, Issue 1, 2011, Pages 88-102

  Da Silva, V Teixeira ^a   Sousa, L A ^a   Amorim, R M ^b,f   Andrini, L ^c   Figueroa, S J A ^c,d   Requejo, F G ^c   Vicentini, Flavio C ^e  

^a FEDERAL UNIVERSITY OF RIO DE JANEIRO   (Brazil)

^b MILITARY INSTITUTE OF ENGINEERING   (Brazil)

^c FACULTAD DE CIENCIAS EXACTAS   (Argentina)

^d EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^e LABORATÓRIO NACIONAL DE LUZ SÍNCROTRON   (Brazil)

^f INPI   (Brazil)

Author keywords

Nickel phosphide; Thiophene hydrodesulfurization; X ray near edge structure

Indexed keywords

ACTIVE SPECIES; CATALYTIC ACTIVITY; CO CHEMISORPTION; DEGREE OF REDUCTION; IN-SITU; NICKEL PHOSPHIDE; SYNTHESIS TEMPERATURES; THIOPHENE HYDRODESULFURIZATION; TIME ON STREAMS; X-RAY ABSORPTION NEAR-EDGE STRUCTURE; X-RAY NEAR-EDGE STRUCTURES; XANES;

ACTIVATION ANALYSIS; CHEMISORPTION; HYDRODESULFURIZATION; NICKEL COMPOUNDS; SILICON COMPOUNDS; THIOPHENE; X RAY DIFFRACTION; X RAYS;

CATALYST ACTIVITY;

EID: 79952455242     PISSN: 00219517     EISSN: 10902694     Source Type: Journal    
DOI: 10.1016/j.jcat.2011.01.010     Document Type: Article

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