Receding contact lines: From sliding drops to immersion lithography

European Physical Journal: Special Topics

Volumn 192, Issue 1, 2011, Pages 195-205

  Winkels, K G ^a   Peters, I R ^a   Evangelista, F ^b   Riepen, M ^b   Daerr, A ^c   Limat, L ^c   Snoeijer, J H ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b ASML   (Netherlands)

^c UNIVERSITÉ PARIS DIDEROT   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 79952343978     PISSN: 19516355     EISSN: 19516401     Source Type: Journal    
DOI: 10.1140/epjst/e2011-01374-6     Document Type: Article

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