New polishing method using water-based slurry under AC electric field for glass substrate

Journal of Magnetism and Magnetic Materials

Volumn 323, Issue 10, 2011, Pages 1394-1397

  Kusumi, Takayuki ^a,b   Sato, Yasuhiro ^a   Akagami, Yoichi ^a   Umehara, Noritsugu ^b  

^a Akita Prefectural R&D Center Industrial Technology Center   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Abrasive; AC electric field; Polishing; Slurry

Indexed keywords

AC ELECTRIC FIELD; APPLIED ELECTRIC FIELD; GLASS SUBSTRATES; IN-SITU OBSERVATIONS; POLISHING TIME; PROCESSING TIME; WATER-BASED SLURRY;

ABRASIVES; ELECTRIC FIELDS; POLISHING; SUBSTRATES;

BOROSILICATE GLASS;

EID: 79952192442     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2010.11.053     Document Type: Conference Paper

References (5)

1. N. Umehara, K. Kato, and T. Hayashi In-situ observation of behaviour of abrasives in magnetic fluid grinding Journal of Magnetism and Magnetic Materials 149 1995 181 184
2. A.T. Skjeltorp Monodisperse particles and ferrofluids: a fruit-fly model system Journal of Magnetism and Magnetic Materials 65 1983 195 203 (Pubitemid 17548383)
3. T. Fujita, and M. Mamiya Interaction forces between nonmagnetic particles in the magnetized magnetic fluid Journal of Magnetism and Magnetic Materials 65 1987 207 210
4. Y. Akagami, T. Fujita, B. Jeyadevan, and N. Umehara ER fluid finishing using rotating electrode Journal of Intelligent Material Systems and Structures 10 1999 753 756
5. F Preston Journal of the Society of Glass Technology 11 1927 214