Polymer-regulated pattern formation in pseudo-2D arrays of a fullerene derivative at the solution - Air interface

Journal of Polymer Science, Part B: Polymer Physics

Volumn 49, Issue 7, 2011, Pages 516-522

  Eliyahu, Shani ^a   Ren, Chunlai ^b   Szleifer, Igal ^c   Yerushalmi Rozen, Rachel ^a  

^a BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

^b NANJING UNIVERSITY   (China)

^c NORTHWESTERN UNIVERSITY   (United States)

Author keywords

depletion; fullerenes; molecular conformation; nanoparticles; poly(ethylene oxide); polymer brush; polymer layers; self assembly; surface activity

Indexed keywords

DEPLETION; MOLECULAR CONFORMATION; POLYMER BRUSH; POLYMER LAYERS; SURFACE ACTIVITY;

BLOCK COPOLYMERS; BRUSHES; BUTYRIC ACID; COPOLYMERIZATION; DERIVATIVES; ESTERS; ETHYLENE; FULLERENES; NANOPARTICLES; PHASE INTERFACES; PHASE SEPARATION; POLYETHYLENE OXIDES; POLYMERS; SELF ASSEMBLY; SURFACE ACTIVE AGENTS;

TWO DIMENSIONAL;

EID: 79952120219     PISSN: 08876266     EISSN: 10990488     Source Type: Journal    
DOI: 10.1002/polb.22200     Document Type: Article

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