Effect of reactive sputtering parameters on TiAlN nanocoating structure and morphology

AIP Conference Proceedings

Volumn 1284, Issue , 2010, Pages 118-124

  Budi, Esmar ^a   Mohd Razali, M ^b   Md Nizam, A R ^b  

^a UNIVERSITAS NEGERI JAKARTA   (Indonesia)

^b UNIVERSITI TEKNIKAL MALAYSIA MELAKA   (Malaysia)

Author keywords

morphology; nitrogen flow rate; sputtering; structure; substrate bias; TiAlN nanocoating

Indexed keywords

EID: 79951939336     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.3515531     Document Type: Conference Paper

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