Rapid erasing of wettability patterns based on TiO2-PDMS composite films

Materials Chemistry and Physics

Volumn 126, Issue 3, 2011, Pages 484-487

  Nakata, Kazuya ^a   Udagawa, Keizo ^a,b   Ochiai, Tsuyoshi ^a   Sakai, Hideki ^b   Murakami, Taketoshi ^a   Abe, Masahiko ^b   Fujishima, Akira ^a,b  

^a KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Composite materials; Plasma; Sol gel growth; Thin films

Indexed keywords

ABSORPTION BAND; BENZOYLACETONE; CARBON ATOMS; CHELATE RING; FILM SURFACES; IR SPECTRUM; OXYGEN ATOM; OXYGEN PLASMAS; PLASMA IRRADIATIONS; RAPID CHANGES; SOL-GEL GROWTH; SOL-GEL METHODS; STRUCTURAL CHANGE; SUPER-HYDROPHILIC; SUPER-HYDROPHILICITY; TIO; ULTRAVIOLET LIGHTS; UV IRRADIATION; UV-VIS ABSORPTIONS; XPS;

ABSORPTION; CARBON FILMS; CHELATION; CONTACT ANGLE; FILM PREPARATION; GELS; GROWTH (MATERIALS); HYDROPHOBICITY; IRRADIATION; MICROCHANNELS; OXYGEN; PLASMAS; SILICONES; SOL-GEL PROCESS; SOL-GELS; SOLS; THIN FILMS;

COMPOSITE FILMS;

EID: 79951680319     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2010.12.003     Document Type: Article

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