Enhancement of photoluminescence in Er-doped Ag-SiO2 nanocomposite thin films: A post annealing study

Vacuum

Volumn 85, Issue 8, 2011, Pages 806-809

  Tiwary, Manisha ^a   Singh, N Kamal ^a   Annapoorni, S ^a   Agarwal, D C ^b   Avasthi, D K ^b   Mishra, Y K ^c   Mazzoldi, P ^d   Mattei, G ^d   Sada, C ^d   Trave, E ^e   Battaglin, G ^e  

^a UNIVERSITY OF DELHI   (India)

^b INTER UNIVERSITY ACCELERATOR CENTRE   (India)

^c UNIVERSITY OF KIEL   (Germany)

^d UNIVERSITY OF PADOVA   (Italy)

^e CA' FOSCARI UNIVERSITY OF VENICE   (Italy)

Author keywords

Photoluminescence; Rutherford backscattering spectroscopy; Secondary ion mass spectroscopy

Indexed keywords

AG NANOPARTICLE; ANNEALED FILMS; ANNEALED SAMPLES; AR ATOM; AR-LASER; ATOM BEAMS; ATOMIC TRANSITION; CHARACTERISTIC SURFACES; CO-DOPED; COSPUTTERING; ER-DOPED; NANOCOMPOSITE THIN FILMS; NITROGEN ATMOSPHERES; OPTICAL ABSORPTION; PL EFFICIENCY; PL EMISSION; PL INTENSITY; POST ANNEALING; RUTHERFORD BACK-SCATTERING; SECONDARY ION MASS SPECTROSCOPY;

ABSORPTION; ABSORPTION SPECTROSCOPY; ANNEALING; ARGON LASERS; ATOMS; BACKSCATTERING; DOPING (ADDITIVES); ENERGY TRANSFER; ERBIUM; IONS; LIGHT ABSORPTION; MASS SPECTROMETERS; NANOCOMPOSITE FILMS; NANOCOMPOSITES; PHOTOLUMINESCENCE; PLASMONS; PUMPING (LASER); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SILICA; SILVER; SURFACE PLASMON RESONANCE; THIN FILMS;

OPTICAL FILMS;

EID: 79951679768     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.12.002     Document Type: Article

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