Lattice stress gradients in thin films deposited by reactive sputtering

ASDAM 2000 - Conference Proceedings: 3rd International EuroConference on Advanced Semiconductor Devices and Microsystems

Volumn , Issue , 2000, Pages 323-326

  Sutta P ^a  

^a Military Academy of Slovakia   (Slovakia)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; FILM GROWTH; METALLIC FILMS; MICROSYSTEMS; MULTILAYER FILMS; OXIDE FILMS; REACTIVE SPUTTERING; SEMICONDUCTOR DEVICES; SPUTTERING; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

DIODE SPUTTERING; LATTICE STRESS; NITRIDE THIN FILMS; ORDER OF LAYERS; PHYSICAL METHODS; R.F. REACTIVE SPUTTERING; SUBSTRATE MATERIAL; SUBSTRATE TEMPERATURE;

FILM PREPARATION;

EID: 79951651366     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASDAM.2000.889511     Document Type: Conference Paper

References (8)

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