Properties of surface metal micromachined rectangular waveguide operating near 3 THz

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 17, Issue 1, 2011, Pages 130-137

  Nordquist, Christopher D ^a   Wanke, Michael C ^a   Rowen, Adam M ^a   Arrington, Christian L ^b   Grine, Albert D ^b   Fuller, Charles T ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b LMATA Government Services LLC   (United States)

Author keywords

Micromachining; rectangular waveguides; submillimeter wave technology

Indexed keywords

GOLD ELECTROPLATING; INTERNAL DIMENSIONS; MICROMACHINED; PHOTORESIST REMOVAL; SILICON SUBSTRATES; SINGLE MODE; SUBMILLIMETER WAVE TECHNOLOGY;

COMPOSITE MICROMECHANICS; MICROMACHINING; MILLIMETER WAVE DEVICES; PHOTORESISTS; SUBMILLIMETER WAVES;

RECTANGULAR WAVEGUIDES;

EID: 79951556998     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSTQE.2010.2049095     Document Type: Article

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