Design and fabrication of computer generated holograms for fresnel domain lithography

Optics InfoBase Conference Papers

Volumn , Issue , 2009, Pages

  Domínguez Caballero, José A ^a   Takahashi, Satoshi ^a   Lee, Sung Jin James ^b   Barbastathis, George ^a,c  

^a Massachusetts Institute of Technology   (United States)

^b SAMSUNG Electronics   (South Korea)

^c SINGAPORE MIT ALLIANCE FOR RESEARCH AND TECHNOLOGY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; HOLOGRAMS; IMAGING SYSTEMS; SENSITIVITY ANALYSIS;

COMPUTER GENERATED HOLOGRAMS; FABRICATION ERRORS; FRESNEL DOMAINS; OPTIMIZATION ALGORITHMS;

COMPUTER GENERATED HOLOGRAPHY;

EID: 79851503762     PISSN: None     EISSN: 21622701     Source Type: Conference Proceeding    
DOI: 10.1364/dh.2009.dwb3     Document Type: Conference Paper

References (8)

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