Erratum: Silicon-germanium interdiffusion in strained Ge/SiGe multiple quantum well structures (Journal of Physics D: Applied Physics (2010) 43 (505303))

Journal of Physics D: Applied Physics

Volumn 44, Issue 7, 2011, Pages

  Liu, Xue Chao ^a   Leadley, D R ^a   Morris, R J H ^a   Myronov, M ^a   Dobbie, A ^a  

^a NONE

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[No Author keywords available]

Indexed keywords

EID: 79751470097     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/7/079501     Document Type: Erratum

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