Fabrication of nanosilicon ink and two-dimensional array of nanocrystalline silicon quantum dots

Japanese Journal of Applied Physics

Volumn 49, Issue 12, 2010, Pages

  Ishikawa, Tetsuya ^a   Nikaido, Hiroki ^a   Usami, Koichi ^a   Uchida, Ken ^a,b   Oda, Shunri ^a,b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALTERNATIVE METHODS; COLLOIDAL SOLUTIONS; FLEXIBLE SUBSTRATE; HIGHLY INTEGRATED; KEY ISSUES; MANUFACTURING COST; NANO-SILICON; NANOCRYSTALLINE SILICON QUANTUM DOTS; PARTICLE SIZE DISTRIBUTION MEASUREMENT; PHOTO-ELECTRONIC DEVICES; QUANTUM DOT; SI-PARTICLE; SILICON SUBSTRATES; SURFACE MODIFICATION; SURFACE MODIFICATION PROCESS; SURFACE REACTIVITY; TOP-DOWN TECHNOLOGY; TWO-DIMENSIONAL ARRAYS; UNIFORM SIZE; WELL-DISPERSED;

AGGLOMERATION; DISSOLUTION; FABRICATION; FLEXIBLE MANUFACTURING SYSTEMS; INK; NANOCRYSTALLINE SILICON; PARTICLE SIZE ANALYSIS; SEMICONDUCTOR QUANTUM DOTS; SUBSTRATES; ZETA POTENTIAL;

TWO DIMENSIONAL;

EID: 79551647909     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.125002     Document Type: Article

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