Intentionally incorporated defect and its consequences in oxide thin film through Radio Frequency Magnetron Sputtering Technique

Indian Journal of Physics

Volumn 84, Issue 6, 2010, Pages 681-685

  Saha, B ^a   Thapa, R ^a   Das, N S ^a   Chattopadhyay, K K ^a  

^a JADAVPUR UNIVERSITY   (India)

Author keywords

Point defect; RF sputtering; Thin film

Indexed keywords

EID: 79551623212     PISSN: 09731458     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12648-010-0071-6     Document Type: Article

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