Recent progress in patterned silicon nanowire arrays: Fabrication, properties and applications

Recent Patents on Nanotechnology

Volumn 5, Issue 1, 2011, Pages 62-70

  Zhang, Yan ^a   Qiu, Teng ^a   Zhang, Wenjun ^b   Chu, Paul K ^b  

^a SOUTHEAST UNIVERSITY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Chemical vapor deposition; Field effect transistor; Molecular beam epitaxy; Patterned silicon nanowire arrays; Selfselective electroless plating; Si solar cells; Thermal conductivity; Thermal evaporation

Indexed keywords

CHEMICAL BEAM EPITAXY; CHEMICAL VAPOR DEPOSITION; ELECTROLESS PLATING; FABRICATION; FIELD EFFECT TRANSISTORS; MOLECULAR BEAM EPITAXY; OPTOELECTRONIC DEVICES; SILICON; SILICON SOLAR CELLS; THERMAL CONDUCTIVITY; THERMAL EVAPORATION;

CRYSTALLOGRAPHIC ORIENTATIONS; MATERIAL SYNTHESIS; NANO SCALE; PATTERNED SILICON; RECENT PROGRESS; SI SOLAR CELLS;

NANOWIRES;

GOLD; NANOWIRE; OXIDE; SILICON;

CHEMISTRY; PATENT; REVIEW; SEMICONDUCTOR; TEMPERATURE; THERMAL CONDUCTIVITY;

GOLD; NANOWIRES; OXIDES; PATENTS AS TOPIC; SILICON; TEMPERATURE; THERMAL CONDUCTIVITY; TRANSISTORS, ELECTRONIC;

EID: 79551618826     PISSN: 18722105     EISSN: None     Source Type: Journal    
DOI: 10.2174/187221011794474921     Document Type: Article

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