Aluminum hard mask technique for the fabrication of high quality submicron Nb/Al-AlOx/Nb Josephson junctions

Superconductor Science and Technology

Volumn 24, Issue 3, 2011, Pages

  Kaiser, C H ^a   Meckbach, J M ^a   Ilin, K S ^a   Lisenfeld, J ^a   Schafer R ^a,b   Ustinov, A V ^a   Siegel, M ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPHASING; FABRICATION PROCESS; HARD MASKS; HIGH QUALITY; I - V CURVE; JOSEPHSON JUNCTIONS; JUNCTION SIZE; QUALITY PARAMETERS; SUBMICRON; SUPERCONDUCTING QUANTUM BITS;

ALUMINUM; ANODIC OXIDATION; JOSEPHSON JUNCTION DEVICES; PHOTOLITHOGRAPHY;

FABRICATION;

EID: 79551602922     PISSN: 09532048     EISSN: 13616668     Source Type: Journal    
DOI: 10.1088/0953-2048/24/3/035005     Document Type: Article

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