Fabrication and characterization of copper nanoparticle thin-films and the electrocatalytic behavior

Analytica Chimica Acta

Volumn 526, Issue 1, 2004, Pages 13-17

  Wang, Haiyan ^a   Huang, Yugai ^a   Tan, Zhian ^a   Hu, Xiaoya ^a  

^a YANGZHOU UNIVERSITY   (China)

Author keywords

Copper nanoparticles; Electrocatalysis; Nitrite; Thin films

Indexed keywords

COPPER NANOPARTICLES; ELECTROCATALYTIC ACTIVITY; ELECTROCATALYTIC BEHAVIOR;

AMINO ACIDS; CATALYSIS; CHARACTERIZATION; COPPER; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMICAL SENSORS; ELECTRON TRANSITIONS; FABRICATION; NANOSTRUCTURED MATERIALS; NITROGEN OXIDES; SCANNING ELECTRON MICROSCOPY;

THIN FILMS;

COPPER DERIVATIVE; CYSTEINE; NANOPARTICLE; NITRIC OXIDE; NITRITE; SILANE DERIVATIVE; TIN DERIVATIVE;

ARTICLE; CATALYSIS; ELECTROCHEMICAL ANALYSIS; ELECTRODE; ELECTRON TRANSPORT; FILM; PRIORITY JOURNAL; REDUCTION; SCANNING ELECTRON MICROSCOPY;

EID: 7944228942     PISSN: 00032670     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.aca.2004.08.060     Document Type: Article

References (29)

1. L.D. Zhang, and J.M. Mu Nanoscale Materials and Nanostructures 2001 Science Press Beijing
2. M.A. El-Sayed Acc. Chem. Res. 34 2001 257
3. Y.W. Cao, R.C. Jin, and C.A. Mirkin Science 297 2002 1536
4. A.D. McFarland, and R.P. Van Duyne Nano Lett. 3 2003 1057
5. A.M. Yu, Z.J. Liang, J.H. Cho, and F. Caruso Nano Lett. 3 2003 1203
6. H.H. Huang, F.Q. Yan, Y.M. Kek, C.H. Chew, G.Q. Xu, W. Ji, P.S. Oh, and S.H. Tang Langmuir 13 1997 172
7. A. Henglein J. Phys. Chem. B 104 2000 1206
8. K.J. Ziegler, C. Doty, K.P. Johnston, and B.A. Korgel J. Am. Chem. Soc. 123 2001 7797
9. Y.H. Yeh, M.S. Yeh, Y.P. Lee, and C.S. Yeh Chem. Lett. 9 1998 1183
10. M.S. Yeh, Y.S. Yang, Y.P. Lee, H.F. Lee, Y.H. Yeh, and C.S. Yeh J. Phys. Chem. B 103 1999 799
11. E.R. Savinova, E.N. Savinova, and V.N. Parmon J. Mol. Catal. 48 1988 231
12. R. Narayanan, and M.A. El-Sayed J. Phys. Chem. B 107 2003 12416
13. W. Lijinsky, and S.S. Epstein Nature 225 1970 21
14. I.A. Wolf, and A.E. Wasserman Science 177 1972 15
15. M.H. Pournaghi-Azar, and H. Dastangoo J. Electroanal. Chem. 567 2004 211
16. D.E. Koshland Science 258 1992 1861
17. A.A. Ensafi, and M. Saminifar Talanta 40 1993 1375
18. J. Hertz, and U. Baltensperger Fresenius Z. Anal. Chem. 318 1984 121
19. J.P. Lei, H.X. Ju, and O. Ikeda J. Electroanal. Chem. 567 2004 331
20. P.V. Kamat J. Phys. Chem. B 106 2002 7729
21. S.J. Dong, X.D. Xi, and M. Tian J. Electroanal. Chem. 385 1995 227
22. M. Brust, M. Walker, D. Bethell, D.J. Schiffrin, and R. Whyman J. Chem. Soc., Chem. Commun. 7 1994 801
23. C.D. Wagner D. Briggs M.P. Seah Practical Surface Analysis, Auger and X-ray photoelectroscopy, second ed., vol. 1 1990 Biddle Ltd, Guildford, Surrey Great Britain 608 641
24. J. Wang, P.V.A. Pamidi, and D.R. Zanette J. Am. Chem. Soc. 120 1998 5852
25. J.J. Harris, and M.L. Bruening Langmuir 16 2000 2006
26. J.E. Toth, and F.C. Anson J. Am. Chem. Soc. 111 1989 2444
27. F.A. Cotton, and G. Wilkinson Advanced Inorganic Chemistry fourth ed. 1980 Wiley New York p. 430
28. G. Stedman Adv. Inorg. Chem. Radiochem. 22 1979 113
29. S.J. Dong, G.L. Che, and Y.W. Xie Chemically Modified Electrodes, revised 2003 Science Press Beijing