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Volumn 357, Issue 3, 2011, Pages 970-975
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Effect of slag basicity and oxygen potential on the distribution of boron and phosphorus between slag and silicon
a
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Author keywords
Activity; Boron; Impurity distribution; Phosphorus; Slag refining
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Indexed keywords
ACTIVITY;
DISTRIBUTION COEFFICIENT;
IMPURITY COMPOUNDS;
IMPURITY DISTRIBUTION;
IMPURITY ELEMENT;
METALLURGICAL-GRADE SILICON;
OPTICAL BASICITY;
OXYGEN PARTIAL PRESSURE;
OXYGEN POTENTIAL;
SLAG BASICITY;
SLAG SYSTEM;
SOLAR GRADE SILICONS;
THERMODYNAMIC CALCULATIONS;
ACTIVITY COEFFICIENTS;
ALUMINUM;
BARIUM;
BASIC OXYGEN PROCESS;
BORON;
BORON COMPOUNDS;
EQUILIBRIUM CONSTANTS;
IMPURITIES;
METAL REFINING;
OXYGEN;
PHOSPHORUS;
SILICON COMPOUNDS;
SILICON OXIDES;
SLAGS;
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EID: 79251597161
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2010.10.033 Document Type: Article |
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Times cited : (74)
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References (14)
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