Direct preparation of 1.35-eV-bandgap CuO:S film by chemical bath deposition

Electrochemical and Solid-State Letters

Volumn 14, Issue 3, 2011, Pages

  Izaki, Masanobu ^a   Yamane, Yusuke ^a   Sasano, Junji ^a   Shinagawa, Tsutomu ^b   Inoue, Mitsuteru ^a  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA WATER; AMMONIUM NITRATE; AQUEOUS SOLUTIONS; BAND GAP ENERGY; BAND GAPS; CHEMICAL-BATH DEPOSITION; COPPER (II); DEPOSITION MECHANISM; DIRECT PREPARATION; GLASS SUBSTRATES; MONOCLINIC LATTICES; PH DIAGRAMS;

AMMONIA; AMMONIUM COMPOUNDS; ENERGY GAP; SUBSTRATES;

FILM PREPARATION;

EID: 78951488776     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3530187     Document Type: Article

References (22)

1. J. J. Loferski, J. Appl. Phys., 7, 777 (1956). 10.1063/1.1722483
2. N. Terada, R. T. Widodo, K. Itoh, S. H. Kong, H. Kashiwabara, T. Okuda, S. Niki, K. Sakurai, A. Yamada, and A. S. Ishizuka, Thin Solid Films, 480-481, 183 (2005). 10.1016/j.tsf.2004.11.081
3. X. Wu, S. Asher, D. H. Levi, D. E. King, Y. Yan, T. A. Gessert, and P. Sheldon, J. Appl. Phys., 89, 4564 (2001). 10.1063/1.1351539
4. F. P. Koffyberg and F. A. Benko, J. Appl. Phys., 53, 1173 (1982). 10.1063/1.330567
5. J. A. Switzer, H. M. Kothari, P. Poizot, S. Nakanishi, and E. W. Bohannan, Nature (London), 425, 490 (2003). 10.1038/nature01990
6. D. Lincot and R. O. Borges, J. Electrochem. Soc., 139, 1880 (1992). 10.1149/1.2069515
7. R. O. Borges and D. Lincot, J. Electrochem. Soc., 140, 3464 (1993). 10.1149/1.2221111
8. C. Hubert, N. Naghavi, B. Canava, A. Etcheberry, and D. Lincot, Thin Solid Films, 515, 6032 (2007). 10.1016/j.tsf.2006.12.139
9. L. Larina, D. H. Shin, N. Tsvetlov, and B. T. Ahn, J. Electrochem. Soc., 156, D469 (2009). 10.1149/1.3212838
10. M. Page, O. Niitsoo, Y. Itzhaik, D. Cahen, and G. Hodes, Energy Environ. Sci., 2, 220 (2009). 10.1039/b813740d
11. G. Hodes, Chemical Solution Deposition of Semiconductor Films, p. 255, Marcel Dekker, New York (2003).
12. M. T. S. Nair and P. K. Nair, Semicond. Sci. Technol., 4, 191 (1989). 10.1088/0268-1242/4/3/009
13. M. T. S. Nair, L. Guerrero, O. L. Arenas, and P. K. Nair, Appl. Surf. Sci., 150, 143 (1999). 10.1016/S0169-4332(99)00239-1
14. J. F. Moulder, W. F. Stiuckel, P. E. Sobol, and K. D. Bomben, Handbook of X-Ray Photoelectron Spectroscopy, Perkin-Elmer Corporation, MN (1992).
15. Joint Committee on Powder Diffraction Standards, Powder Diffraction File, 13-836, International Data for Diffraction Data, Swarthmore, PA (1992).
16. R. Jenkins and R. L. Snyder, Introduction of X-Ray Powder Diffractometry, p. 89, John Wiley & Sons, New York (1996).
17. M. Izaki, T. Saito, M. Chigane, M. Ishikawa, J. Katayama, M. Inoue, and M. Yamashita, J. Mater. Chem., 11, 1972 (2001). 10.1039/b104358g
18. S. D. Bagul, S. D. Chavhan, and R. J. Sharma, J. Phys. Chem. Solids, 68, 1623 (2007). 10.1016/j.jpcs.2007.03.053
19. C. Platzer-Bjorkman, J. Malmstrom, T. Torndahl, and M. Edoff, Phys. Rev. Lett., 97, 146403 (2006). 10.1103/PhysRevLett.97.146403
20. R. M. Smith and A. E. Martell, Critical Stability Constants, p. 41, Plenum Press, New York (1989).
21. M. Pourbaix, Atlas of Electrochemical Equilibria in Aqueous Solutions, p. 545, NACE International, Cebelcor, TX (1974).
22. C. Hubert, N. Naghavi, A. Etcheberry, and D. Lincot, Thin Solid Films, 12, 139 (2006).