The production of primary radicals in photopolymers during holographic exposure

Optik

Volumn 121, Issue 24, 2010, Pages 2273-2275

  Gleeson, Michael R ^a   Liu, Shui ^a   Sheridan, John T ^a  

^a UNIVERSITY COLLEGE DUBLIN   (Ireland)

Author keywords

Holography; Optical storage materials; Photosensitive materials; Polymers

Indexed keywords

ABSORPTION EFFECTS; INITIATION MECHANISM; KINETIC BEHAVIOUR; OPTICAL STORAGE MATERIALS; PHOTON ABSORPTIONS; PHOTOPOLYMER MATERIAL; PHOTOSENSITIVE MATERIALS; PRIMARY MECHANISM; PRIMARY RADICALS; TEMPORAL AND SPATIAL VARIATION; TIME VARYING;

ABSORPTION; FREE RADICAL REACTIONS; HOLOGRAPHY; LIGHT SENSITIVE MATERIALS; PHOTOCHEMICAL REACTIONS; PHOTOPOLYMERS; PHOTOREFRACTIVE MATERIALS; PHOTOSENSITIVITY;

MATERIALS;

EID: 78751579229     PISSN: 00304026     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijleo.2009.09.012     Document Type: Article

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