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Volumn 109, Issue 1, 2011, Pages

High order symmetry interference lithography based nanoimprint

Author keywords

[No Author keywords available]

Indexed keywords

HIGH FIDELITY; HIGH ORDER SYMMETRY; HYBRID SOL-GEL; INTERFERENCE LITHOGRAPHY; LONG DISTANCES; NANO-IMPRINT; POTENTIAL SURFACES; PURE SILICA; PURE SILICON; THREE-DIMENSIONAL STRUCTURE; TRANSFER LAYERS; TWO-STEP PROCESS;

EID: 78751549203     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3530729     Document Type: Article
Times cited : (8)

References (14)
  • 12


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.