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Volumn 109, Issue 1, 2011, Pages
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High order symmetry interference lithography based nanoimprint
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Author keywords
[No Author keywords available]
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Indexed keywords
HIGH FIDELITY;
HIGH ORDER SYMMETRY;
HYBRID SOL-GEL;
INTERFERENCE LITHOGRAPHY;
LONG DISTANCES;
NANO-IMPRINT;
POTENTIAL SURFACES;
PURE SILICA;
PURE SILICON;
THREE-DIMENSIONAL STRUCTURE;
TRANSFER LAYERS;
TWO-STEP PROCESS;
MECHANICAL STABILITY;
SILICA;
NANOIMPRINT LITHOGRAPHY;
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EID: 78751549203
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.3530729 Document Type: Article |
Times cited : (8)
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References (14)
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