Fabrication-tolerant 1310 nm laterally-coupled distributed feedback lasers with high side mode suppression ratios

AIP Conference Proceedings

Volumn 1288, Issue , 2010, Pages 88-92

  Millett, R ^a   Dridi, K ^a   Benhsaien, A ^a   Schriemer, H ^a   Hinzer, K ^a   Hall, T ^a  

^a UNIVERSITY OF OTTAWA   (Canada)

Author keywords

And stepper lithography; Distributed feedback lasers; Side mode suppression ratio; Third order gratings

Indexed keywords

EID: 78651072177     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.3521380     Document Type: Conference Paper

References (10)

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