Silylation efficiency of chorosilanes, alkoxysilanes, and monosilazanes on periodic mesoporous silica

Journal of Physical Chemistry C

Volumn 114, Issue 51, 2010, Pages 22603-22609

  Deschner, Thomas ^a   Liang, Yucang ^b   Anwander, Reiner ^a,b  

^a UNIVERSITY OF BERGEN   (Norway)

^b UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALKOXYSILANES; BET SURFACE; ELEMENTAL ANALYSIS; ELEVATED TEMPERATURE; ETHOXYSILANES; FTIR SPECTROSCOPY; FUNCTIONALIZATIONS; LARGE SURFACE AREA; MESOPOROUS SILICA; OUTER SURFACE; PORE ARCHITECTURE; PORE BLOCKAGES; PORE DIAMETERS; PORE OPENINGS; PORE VOLUME; POSTSYNTHESIS; RANDOM SURFACES; REACTION CONDITIONS; SILANOL GROUPS; SILANOLS; SILYLATIONS; SITE-SPECIFIC; SIZE-SELECTIVE; SUPPORT MATERIALS; SURFACE SILYLATION; THERMODYNAMICALLY STABLE;

CHEMICAL REACTIONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MESOPOROUS MATERIALS; PHYSISORPTION; SILICA; SURFACES; TRANSMISSION ELECTRON MICROSCOPY;

HYBRID MATERIALS;

EID: 78650610561     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp107749g     Document Type: Article

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