Formation mechanism of robust silver nanoparticle film with superhydrophobicity

Applied Physics Letters

Volumn 97, Issue 24, 2010, Pages

  Guo, Zhiguang ^a,b   Liu, Weimin ^b  

^a HUBEI UNIVERSITY   (China)

^b LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AG NANOPARTICLE; ANODIC PROCESS; CATHODIC PROCESS; FORMATION MECHANISM; GALVANIC CELLS; IN-SITU; SI WAFER; SILICON SUBSTRATES; SILVER NANOPARTICLES; SUPERHYDROPHOBICITY;

HYDROPHOBICITY; NANOPARTICLES; REDOX REACTIONS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

SILVER;

EID: 78650385709     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3525574     Document Type: Article

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