Protocrystalline silicon for micromorph tandem cells on gen. 5 size

Materials Research Society Symposium Proceedings

Volumn 1245, Issue , 2010, Pages 25-30

  Van Elzakker, Gijs ^a   Sixtensson, Daniel ^a   Papathanasiou, Niklas ^a   Neubeck, Klaus ^a   Sillmann, Roland ^a  

^a Inventux Technologies AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

GROWTH RATE; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SOLAR CELLS;

HIGH-VOLUME PRODUCTION; HYDROGENATED AMORPHOUS SILICON (A-SI:H); LIGHT-INDUCED DEGRADATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD); PROTOCRYSTALLINE SILICON; STABILIZED EFFICIENCY; STAEBLER-WRONSKI EFFECT; TANDEM CONFIGURATION;

AMORPHOUS SILICON;

EID: 78650381905     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-1245-a01-03     Document Type: Conference Paper

References (4)

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2. G. van Elzakker, P. Sutta and M. Zeman, in Amorphous and Poly crystalline Thin-Film Silicon Science and Technology 2009, edited by A. Flewitt, Q. Wang, J. Hou, S. Uchikoga, A. Nathan (Mater. Res. Soc. Symp. Proc. Volume 1153, Warrendale, PA, 2009) p. A18-02.
3. http://www.simkopp.de/rvm/ (Neither the authors of this paper nor the Materials Research Society warrants or assumes liability for the content or availability of this URL.)
4. P. Chaudhuri, S. Ray, A. K. Batabyal, and A. K. Barua, Solar Cells 31, p. 13 (1991).