Two-dimensional self-assemblies of silica nanoparticles formed using the "bubble deposition technique"

Langmuir

Volumn 26, Issue 22, 2010, Pages 16828-16832

  Zhang, Xinfeng ^a,b   Tang, Guolei ^a   Yang, Shihe ^b   Benattar, Jean Jacques ^a  

^a DIF   (France)

^b HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION TECHNIQUE; DEPOSITION TIME; EXPERIMENTAL PARAMETERS; HEXAMETHYLDISILAZANE; HYDROPHOBIC SUBSTRATE; NANO-DEVICES; NANOPARTICLE ASSEMBLIES; NANOPARTICLE CONCENTRATIONS; PATTERNED SUBSTRATES; SILICA NANOPARTICLES; SILICON SUBSTRATES; SURFACE COVERAGES; SURFACTANT CONCENTRATIONS; SURFACTANT SOLUTION; TOP-DOWN APPROACH;

HYDROPHOBICITY; MONOLAYERS; NANOPARTICLES; SILICA; SURFACE ACTIVE AGENTS; TWO DIMENSIONAL;

SUBSTRATES;

HEXAMETHYLSILAZANE; NANOPARTICLE; ORGANOSILICON DERIVATIVE; SILICON DIOXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; METHODOLOGY; NANOTECHNOLOGY; PRINTING;

MICROSCOPY, ATOMIC FORCE; NANOPARTICLES; NANOTECHNOLOGY; ORGANOSILICON COMPOUNDS; PRINTING; SILICON DIOXIDE;

EID: 78650375453     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la102894c     Document Type: Article

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