Behaviors of monomer H2O on the Cu(111) surface under surface charges

Journal of Physical Chemistry C

Volumn 114, Issue 45, 2010, Pages 19331-19337

  Zhang, P ^a   Zheng, W T ^a   Jiang, Q ^a  

^a Jilin University   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AB INITIO; ADSORPTION ENERGIES; ADSORPTION SITE; ATOP SITES; CU(1 1 1); HIGH SYMMETRY; NEGATIVELY CHARGED SURFACES; POSITIVELY CHARGED SURFACES;

ACTIVATION ENERGY; CHARGED PARTICLES; DENSITY FUNCTIONAL THEORY; DISSOCIATION; SURFACE CHARGE;

ADSORPTION;

EID: 78650350860     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp105180d     Document Type: Article

References (42)

1. Thiel, P. A.; Madey, T. E. Surf. Sci. Rep. 1987, 7, 211.
2. Mundy, C. J.; Kuo, I. F. W. Chem. Rev. 2006, 106, 1282.
3. Filhol, J. S.; Neurock, M. Angew. Chem., Int. Ed. 2006, 45, 402.
4. Gokhale, A. A.; Dumesic, J. A.; Mavrikakis, M. J. Am. Chem. Soc. 2008, 130, 1402.
5. Phatak, A. A.; Delgass, W. N.; Ribeiro, F. H.; Schneider, W. F. J. Phys. Chem. C 2009, 113, 7269.
6. Masatoki, I. Surf. Sci. Rep. 2008, 63, 329.
7. Carrasco, J.; Michaelides, A.; Forster, M.; Haq, S.; Raval, R.; Hodgson, A. Nat. Mater. 2009, 8, 427.
8. Michaelides, A.; Morgenstern, K. Nat. Mater. 2007, 6, 597.
9. Gawronski, H.; Carrasco, J.; Michaelides, A.; Morgenstern, K. Phys. Rev. Lett. 2008, 101, 136102.
10. Mehlhorn, M.; Carrasco, J.; Michaelides, A.; Morgenstern, K. Phys. Rev. Lett. 2009, 103, 026101.
11. Duan, S.; Wu, D. Y.; Xu, X.; Luo, Y.; Tian, Z. Q. J. Phys. Chem. C 2010, 114, 4051.
12. Michaelides, A.; Alavi, A.; King, D. A. Phys. Rev. B 2004, 69, 113404.
13. Taylor, C. D.; Wasileski, S. A.; Filhol, J. S.; Neurock, M. Phys. Rev. B 2006, 73, 165402.
14. Rai, V.; Aryanpour, M.; Pitsch, H. J. Phys. Chem. C 2008, 112, 9760.
15. Zhao, J.; Chan, C. T.; Chen, J. G. Phys. Rev. B 2007, 75, 085435.
16. Fang, Y. H.; Liu, Z. P. J. Phys. Chem. C 2009, 113, 9765.
17. Hamada, I.; Morikawa, Y. J. Phys. Chem. C 2008, 112, 10889.
18. Hansen, H. A.; Rossmeisl, J.; Nørskov, J. K. Phys. Chem. Chem. Phys. 2008, 10, 3722.
19. Ren, J.; Meng, S. J. Am. Chem. Soc. 2006, 128, 9282.
20. Ren, J.; Meng, S. Phys. Rev. B 2008, 77, 054110.
21. Li, J. B.; Zhu, S. L.; Li, Y.; Wang, F. H. Phys. Rev. B 2007, 76, 235433.
22. Li, J. B.; Zhu, S. L.; Li, Y.; Oguzie, E. E.; Wang, F. H. J. Phys. Chem. C 2008, 112, 8301.
23. Li, J. B.; Zhu, S. L.; Li, H.; Oguzie, E. E.; Li, Y.; Wang, F. H. J. Phys. Chem. C 2009, 113, 1931.
24. Delley, B. J. Chem. Phys. 1990, 92, 508.
25. Delley, B. J. Chem. Phys. 2000, 113, 7756.
26. Perdew, J. P.; Burke, K.; Ernzerhof, M. Phys. Rev. Lett. 1996, 77, 3865.
27. Roldán, A.; Ricart, J. M.; Illas, F. Theor. Chem. Acc. 2009, 123, 119.
28. Koelling, D. D.; Harmon, B. N. J. Phys. C: Solid State Phys. 1977, 10, 3107.
29. Gao, W.; Zhao, M.; Jiang., Q. J. Phys. Chem. C 2007, 111, 4042.
30. Gao, W.; Zheng, W. T.; Jiang., Q. J. Chem. Phys. 2008, 129, 164705.
31. Liu, W.; Zhao, Y. H.; Zhang, R. Q.; Li, Y.; Lavernia, E. J.; Jiang, Q. ChemPhysChem 2009, 10, 3295.
32. Ao, Z. M.; Peeters, F. M. Appl. Phys. Lett. 2010, 96, 253106.
33. Benedek, N. A.; Snook, I. K.; Latham, K.; Yarovsky, I. J. Chem. Phys. 2005, 122, 144102.
34. Wasileski, S. A.; Janik, M. J. Phys. Chem. Chem. Phys. 2008, 10, 3613.
35. Gohda, Y.; Schnur, S.; Groβ, A. Faraday Discuss. 2008, 140, 233.
36. Bocquet, M. L.; Lorente, N. J. Chem. Phys. 2009, 130, 124702.
37. Filhol, J. S.; Bocquet, M. L. Chem. Phys. Lett. 2007, 438, 203.
38. Michaelides, A.; Ranea, V. A.; de Andres, P. L.; King, D. A. Phys. Rev. Lett. 2003, 90, 216102.
39. Michaelides, A. Faraday Discuss. 2007, 136, 287.
40. Meng, S.; Wang, E. G.; Gao, S. W. Phys. Rev. B 2004, 69, 195404.
41. Ranea, V. A.; Michaelides, A.; Ramírez, R.; Verges, J. A.; de Andres, P. L.; King, D. A. Phys. Rev. B 2004, 69, 205411.
42. Mchaelides, A.; Alavi, A.; King, D. A. J. Am. Chem. Soc. 2003, 125, 2746.