Simple method for preparation of porous polyimide film with an ordered surface based on in situ self-assembly of polyamic acid and silica microspheres

Langmuir

Volumn 26, Issue 23, 2010, Pages 18357-18361

  Wang, Chao ^a,b   Wang, Qihua ^a   Wang, Tingmei ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COLLOID SOLUTIONS; FACILE METHOD; HYDROGEN BONDINGS; HYDROXYL GROUPS; IN-SITU; MASS PRODUCTION; POLYAMIC ACIDS; POLYIMIDE FILM; POROUS STRUCTURES; PRECISE CONTROL; PREPARATION PROCESS; SILICA MICROSPHERES; SIMPLE METHOD; SOLVENT EVAPORATION; SURFACE-BASED; VACUUM DRYING;

COLLOID CHEMISTRY; MICROSPHERES; POLYIMIDES; POLYMERIC FILMS; SELF ASSEMBLY; SILICA; SURFACE TOPOGRAPHY; TOPOGRAPHY; VACUUM EVAPORATION;

FILM PREPARATION;

BENZENE DERIVATIVE; IMIDE; MICROSPHERE; POLYAMIC ACID; POLYMER; SILICON DIOXIDE; SOLVENT;

ARTICLE; CHEMICAL PHENOMENA; CHEMISTRY; METHODOLOGY; POROSITY; SURFACE PROPERTY; WETTABILITY;

BENZENE DERIVATIVES; CHEMISTRY; HYDROPHOBIC AND HYDROPHILIC INTERACTIONS; IMIDES; MICROSPHERES; POLYMERS; POROSITY; SILICON DIOXIDE; SOLVENTS; SURFACE PROPERTIES; WETTABILITY;

EID: 78650229469     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la103473u     Document Type: Article

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