Texturing of silicon using a microporous polymer etch mask

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 28, Issue 6, 2010, Pages

  Korivi, N S ^a   Hoffpauir, J ^a   Ajmera, P K ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

POLYMERS; SURFACES;

CHEMICAL ETCH; ETCH MASK; FOREIGN MATERIALS; INTERCONNECTED PORES; INTERCONNECTED STRUCTURES; MICRO-SCALES; MICROPOROUS POLYMERS; POLYMER LAYERS; POLYMERIC LAYERS; SILICON SURFACES;

POROUS SILICON;

EID: 78650160500     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3507890     Document Type: Article

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