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78650139193
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note
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-1, 0.35 wt % in water) were purchased from Sigma-Aldrich (Milwaukee, WI).
-
-
-
-
32
-
-
78650154283
-
-
note
-
The following aqueous mixtures were prepared using 18.2 MΩ deionized water from a Direct-Q 5 Ultrapure Water System (Millipore, Billerica, MA). Aqueous solutions of PEI (0.1 wt % in deionized water) were prepared by rolling for 24 h. Prior to deposition, each PEI solution's pH was altered to 10 using 1 M HCl. Aqueous solutions of PAA (0.2 wt % in deionized water) were prepared by rolling for 24 h, and each PAA solution's pH was altered to 4 using 1 M NaOH. Anionic suspensions of MMT (1.0 wt % in deionized water) were prepared by rolling for 24 h. Each appropriately treated substrate was dipped in the PEI solution for 5 min, rinsed with deionized water, and dried. This procedure was followed by an identical dipping, rinsing, and drying procedure in the PAA solution. After this initial bilayer was deposited, the same procedure was followed with only 1 min dip times for subsequent layers. This procedure was repeated until the desired number of layers was achieved. All thin films were prepared using a home-built robotic dipping system. (46, 47)
-
-
-
-
33
-
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78650159190
-
-
note
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Film thickness was measured using a PHE-101 discrete wavelength ellipsometer (Micro Photonics, Allentown, PA) at a wavelength of 632.8 nm and a 65° incidence angle. Single side polished (100) silicon wafers (University Wafer, South Boston, MA), 500 μm in thickness, were used as substrates for film growth characterized by ellipsometry. Silicon wafers and fused quartz slides (36) were piranha treated for 30 min in preparation for deposition. (48) [ Caution! Piranha solution reacts violently with organic materials and should be handled with extreme caution.]
-
-
-
-
34
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48449095869
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Exponential growth of LBL films with incorporated inorganic sheets
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35
-
-
78650091533
-
-
note
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Deposited mass as a function of layers deposited was measured using a research quartz crystal microbalance (QCM) (Maxtek Inc., Cypress, CA). Polished Ti/Au crystals with a resonance frequency of 5 MHz from Maxtek were plasma cleaned using a PDC-32G (Harrick Plasma, Ithaca, NY) and used as deposition substrates for quartz crystal microbalance characterization.
-
-
-
-
36
-
-
78650080930
-
-
note
-
Using a USB2000 UV-Vis spectrometer (Ocean Optics, Dunedin, FL), thin film absorbance was monitored at wavelengths between 190 and 900 nm. Fused quartz slides (Structure Probe Inc., West Chester, PA) were used as substrates for UV-vis characterization.
-
-
-
-
37
-
-
78650111570
-
-
note
-
Thin film cross sections were imaged at calibrated magnifications using a JEOL 1200EX (Parbody, MA) transmission electron microscope at an accelerating voltage of 100 kV. Carbon stabilized, Formvar coated 150 mesh nickel grids (Electron Microscopy Sciences, Hatlfield, PA) and polystyrene film with a thickness of 250 μm (Goodfellow, Huntington, England) were used for TEM. PS and PET (39) substrates were prepared for deposition by rinsing with deionized water, methanol, and water again before being dried with filtered air. PS substrates were then plasma cleaned prior to film deposition. (35) Prior to imaging, films deposited onto PS were coated with carbon on one side, embedded in epoxy prior to sectioning, and floated on ethylene glycol.
-
-
-
-
38
-
-
78650155393
-
-
note
-
Thin film topographical phase image was obtained using a Nanosurf2 atomic force microscope (Nanoscience Instruments, Phoenix, AZ) in phase contrast mode with aT300R AFM probe (Vista Probes, Phoenix, AZ) at a free vibration amplitude of 0.1 V.
-
-
-
-
39
-
-
78650143819
-
-
note
-
2•day•atm) under dry conditions. Films created for OTR testing were heated immediately following deposition in an oven for 15 min at 70 °C.
-
-
-
-
40
-
-
0033101539
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Preparation of oxygen gas barrier poly(ethylene terephthalate) films by deposition of silicon oxide films plasma-polymerized from a mixture of tetramethoxysilane and oxygen
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