Silicon Ink Selective emitter process: Optimization of selectively diffused regions for short wavelength response

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2010, Pages 3565-3569

  Poplavskyy, D ^a   Scardera, G ^a   Abbott, M ^a   Meisel, A ^a   Chen, X ^a   Shah, S ^a   Tai, E ^a   Terry, M ^a   Lemmi, F ^a  

^a Innovalight Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CELL EFFICIENCY; CELL STRUCTURE; COLLOIDAL DISPERSION; DOPANT PROFILE; EMITTER DOPING; FRONT SURFACES; PATTERN ALIGNMENT; PROCESSING WINDOWS; SELECTIVE EMITTERS; SHORT WAVELENGTHS; SHORT-WAVELENGTH; SILICON NANOPARTICLES; SINGLE-STEP;

DOPING (ADDITIVES); OPTIMIZATION; PHOTOVOLTAIC EFFECTS;

INK;

EID: 78650154843     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2010.5614303     Document Type: Conference Paper

References (11)

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