ZnO films with very high haze ratio prepared by MOCVD technique

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2010, Pages 1592-1596

  Yunaz, Ihsanul Afdi ^a   Hongsingthong, Aswin ^a   Zhang, Liping ^a   Miyajima, Shinsuke ^a   Konagai, Makoto ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON-DOPED; ELECTRICAL PROPERTY; FILM DEPOSITION; GLASS SUBSTRATES; LONG WAVELENGTH; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOCVD; SI SOLAR CELLS; SILICON-BASED THIN FILMS; TREATMENT TIME; ZNO; ZNO FILMS;

BORON; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; GLASS; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; ORGANOMETALLICS; OXIDE FILMS; PHOTOVOLTAIC EFFECTS; SEMICONDUCTING SILICON COMPOUNDS; SOLAR CELLS; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION;

ZINC OXIDE;

EID: 78650139007     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2010.5617007     Document Type: Conference Paper

References (5)

1. W. W. Wenas, A. Yamada, M.. Konagai and K. Takahashi, "Textured ZnO Thin Films for Solar Cells Grown by Metalorganic Chemical Vapor Deposition", Jpn. J. Appl. Phys. 30, 1991, pp. L441-L443.
2. J. Bailat, D. Domine, R. Schluchter, J. Steinhauser, S. Fay, F. Freitas, C. Bucher, L. Feitknecht, X. Niquille, T. Tscharner, A. Shah, and C. Ballif, "High-Efficiency P-I-N Microcrystalline and Micromorph Thin Film Silicon Solar Cells Deposited on LPCVD ZnO Coated Glass Substrates", Conf. Record of 4th WCPEC, Hawaii, 2007, pp. 1533-1536.
3. 2O Gas Mixture for Use as TCO in Silicon-Based Thin Film Solar Cells", to be published in Sol. Energy Mater. Sol. Cells, 2010.
4. 2:F Films and Cell Reflectance", Jpn. J. Appl. Phys. 27, 1988, pp. 2053-2061.
5. A. Hongsingthong, I. A. Yunaz, S. Miyajima, and M. Konagai, "ZnO Films Prepared by Two-Step MOCVD Process for Use as Front TCO in Silicon-Based Thin Film Solar Cells", this conference.