Single-particle blocking and collective magnetic states in discontinuous CoFe/Al2O3 multilayers

Journal of Physics D: Applied Physics

Volumn 43, Issue 47, 2010, Pages

  Bedanta, S ^a,b,e,h   Petracic, O ^a,f   Chen, X ^a   Rhensius, J ^a,g   Kentzinger, E ^b   Rucker U ^b   Bruckel T ^b   Doran, A ^c   Scholl, A ^c   Cardoso, S ^d   Freitas, P P ^d   Kleemann, W ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d INESC   (Portugal)

^e NATIONAL INSTITUTE OF SCIENCE EDUCATION AND RESEARCH   (India)

^f RUHR UNIVERSITY BOCHUM   (Germany)

^g UNIVERSITY OF KONSTANZ   (Germany)

^h Eastern Academy of Science and Technology   (India)

Author keywords

[No Author keywords available]

Indexed keywords

AC SUSCEPTIBILITY; COLE-COLE PLOTS; DEPTH PROFILE; DIPOLAR INTERACTION; DYNAMIC HYSTERESIS; DYNAMIC SCALING; IDEAL SYSTEMS; INTER-PARTICLE INTERACTION; INTERPARTICLE DISTANCES; LAYER THICKNESS; MAGNETIC STATE; MAGNETO-OPTIC KERR EFFECT; MATRIX; MEMORY EFFECTS; METAL-INSULATOR MULTILAYERS; PARTICLE CONCENTRATIONS; PARTICLE DENSITIES; POLARIZED NEUTRON REFLECTOMETRY; SINGLE-PARTICLE; SOFT FERROMAGNETIC; STRONG INTERACTION; SUPERSPIN GLASS; X-RAY-PHOTO-EMISSION ELECTRON MICROSCOPIES;

AMORPHOUS MATERIALS; ASSOCIATION REACTIONS; KERR MAGNETOOPTICAL EFFECT; MAGNETIC FIELD EFFECTS; MAGNETIC SUSCEPTIBILITY; METAL INSULATOR BOUNDARIES; NANOPARTICLES; PARTICLE INTERACTIONS; SOLVENTS;

MULTILAYERS;

EID: 78650119798     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/47/474002     Document Type: Article

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