To charge or not to charge: 50 years of lithographic choices

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 28, Issue 6, 2010, Pages

  Pease, R Fabian ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; INTEGRATED CIRCUITS;

HIGH RESOLUTION; MECHANICAL CONTACT; MOORE'S LAW; NANO-IMPRINTING; OPTICAL LITHOGRAPHY; OPTICAL TECHNOLOGY; PARTICLE LITHOGRAPHY; THREE DIMENSIONAL INTEGRATION;

PHOTOLITHOGRAPHY;

EID: 78650103644     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3517607     Document Type: Article

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