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Volumn , Issue , 2010, Pages 2222-2228

Power SiC DMOSFET model accounting for JFET region nonuniform current distribution

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER DISTRIBUTIONS; CURRENT SATURATION; CURRENT SPREADING; DEVICE GEOMETRIES; DMOSFET; DRAIN-SOURCE VOLTAGE; FINITE ELEMENT SIMULATIONS; IS DEVELOPMENT; NONUNIFORM CURRENT DISTRIBUTIONS;

EID: 78650079098     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ECCE.2010.5617830     Document Type: Conference Paper
Times cited : (4)

References (8)
  • 2
    • 0036167074 scopus 로고    scopus 로고
    • Excellent effects of hydrogen postoxidation annealing on inversion channel mobility of 4H-SiC MOSFET fabricated on (1120) face
    • DOI 10.1109/55.974797, PII S0741310602004561
    • [Junji Senzaki et al, "Excellent effect of hydrogen postoxidation annealing on inversion channel mobility of 4H-SiC MOSFET fabricated on (1120) face", IEEE Electron Device Letters, Vol. 23, No. 1, pp. 13-15, 2002. (Pubitemid 34140620)
    • (2002) IEEE Electron Device Letters , vol.23 , Issue.1 , pp. 13-15
    • Senzaki, J.1    Kojima, K.2    Harada, S.3    Kosugi, R.4    Suzuki, S.5    Suzuki, T.6    Fukuda, K.7
  • 3
    • 18644363008 scopus 로고    scopus 로고
    • Physics-based numerical modeling and characterization of 6H-silicon-carbide metal-oxide-semiconductor field-effect transistors
    • Stephen K. Powell et al, "Physics-based numerical modeling and characterization of 6H-silicon-carbide metal-oxide-semiconductor field-effect transistors", Journal of Appl. Physics, Vol. 92, No 7, pp. 4053-4061, 2002.
    • (2002) Journal of Appl. Physics , vol.92 , Issue.7 , pp. 4053-4061
    • Powell, S.K.1
  • 4
    • 1642269053 scopus 로고    scopus 로고
    • Numerical modeling and simulation of nonuniformly doped channel 6H-silicon carbide MOSFET
    • Navneet Kaushik et al, "Numerical modeling and simulation of nonuniformly doped channel 6H-silicon carbide MOSFET", Semicond. Sci. Technol., No19, pp. 373-379, 2004.
    • (2004) Semicond. Sci. Technol. , vol.19 , pp. 373-379
    • Kaushik, N.1
  • 5
    • 33244469263 scopus 로고    scopus 로고
    • A field-effect electron mobility model for SiC MOSFETs including high density of traps at the interface
    • DOI 10.1016/j.mee.2005.11.007, PII S016793170500523X
    • A. Perez-Tomas et al, "Field-effect electron mobility model for SiC MOSFETs including high density of traps at the interface", Microelectronics Engineering, No. 83, pp. 440-445, 2006. (Pubitemid 43279678)
    • (2006) Microelectronic Engineering , vol.83 , Issue.3 , pp. 440-445
    • Perez-Tomas, A.1    Godignon, P.2    Mestres, N.3    Millan, J.4
  • 7
    • 49249121553 scopus 로고    scopus 로고
    • Characterization, modeling, and application of 10-kV SiC MOSFET
    • Jun Wang et al, "Characterization, modeling, and application of 10- kV SiC MOSFET", IEEE Trans. Electron devices, No. 8, pp. 1798- 1806, 2008.
    • (2008) IEEE Trans. Electron Devices , vol.8 , pp. 1798-1806
    • Wang, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.