Direct synthesis of yttrium aluminum garnet particles in an inductively coupled radio-frequency plasma system

Plasma Chemistry and Plasma Processing

Volumn 30, Issue 6, 2010, Pages 795-811

  Jain, Ricky ^a   Girshick, Steven L ^a   Heberlein, Joachim V ^a   Mukherjee, Rajesh ^b   Zhang, Bin ^b   Nakamura, Toshitaka ^b   Mochizuki, Amane ^b  

^a University of Minnesota   (United States)

^b Biomedical Group   (United States)

Author keywords

In flight annealing; Phosphors; RF plasma; Yttrium aluminum garnet (YAG)

Indexed keywords

CERAMIC TUBES; DIRECT SYNTHESIS; EX-SITU ANNEALING; FLOW RECIRCULATION; HIGH TEMPERATURE; IN-FLIGHT ANNEALING; INDUCTIVELY-COUPLED; NUMERICAL MODELING; PARTICLE COLLECTION; PHOSPHOR MATERIALS; PHOSPHOR PARTICLES; RADIO FREQUENCY PLASMA; RF PLASMA; SIZE CONTROL; SUBMICRON-SIZED; SYNTHESIS TECHNIQUES; SYNTHESIZED PARTICLES; THERMAL PLASMA; YAG; YTTRIUM ALUMINUM GARNET; YTTRIUM ALUMINUM GARNET (YAG);

ALUMINUM; ANNEALING; CERIUM; ELECTROMAGNETIC INDUCTION; GARNETS; ION BEAMS; LIGHT EMISSION; LIGHT EMITTING DIODES; PHOSPHORS; PLASMA DEVICES; PLASMA THEORY; SILICATE MINERALS; TUBES (COMPONENTS); WAVE PLASMA INTERACTIONS; YTTRIUM;

YTTRIUM ALLOYS;

EID: 78650020051     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-010-9260-5     Document Type: Article

References (39)

1. DR Messier GE Gazza 1972 Am Ceram Soc Bull 51 9 692 694
2. AY Neiman EV Tkachenko LA Kvichko LA Kotok 1980 Russ J Inorg Chem 25 9 2340 2345
3. S Ramanathan M Kakade S Roy K Kutty 2003 Ceram Int 29 5 477 484 10.1016/S0272-8842(02)00190-6
4. MB Kakade S Ramanathan PV Ravindran 2003 J Alloys Compd 350 123 129 10.1016/S0925-8388(02)00951-9
5. Y Pan M Wu Q Su 2004 Mater Sci Eng B 106 3 251 256 10.1016/j.mseb.2003. 09.031
6. WT Hsu WH Wu CH Lu 2003 Mater Sci Eng B 104 1-2 40 44 10.1016/S0921-5107(03)00268-X
7. F Huanga L Dongb Z Fua H Wanga W Wanga Y Wanga 2009 J Ceram Process Res 10 6 807 810
8. YT Nien YL Chen IG Chen CS Hwang YK Su SJ Chang FS Juang 2005 Mater Chem Phys 93 1 79 83 10.1016/j.matchemphys.2005.02.017 (Pubitemid 40819473)
9. M Inoue T Nishikawa T Inui 1998 J Mater Sci 33 24 5835 5841 10.1023/A:1004466402877
10. R Kasuya T Isobe H Kuma J Katano 2005 J Phys Chem B 109 47 22126 22130 10.1021/jp052753j (Pubitemid 41796685)
11. S Lee SY Seo 2002 J Electrochem Soc 149 J85 10.1149/1.1511755 (Pubitemid 35465644)
12. L Su A Tok F Boey X Zhang J Woodhead C Summers 2007 J Appl Phys 102 8 3541 10.1063/1.2798513
13. CH Lu R Jagannathan 2002 Appl Phys Lett 80 3608 10.1063/1.1475772 2002ApPhL..80.3608L (Pubitemid 34637335)
14. SD Parukuttyamma J Margolis H Liu CP Grey S Sampath H Herman JB Parise 2004 J Am Ceram Soc 84 8 1906 10.1111/j.1151-2916.2001.tb00935.x
15. BG Ravi AS Gandhi X Guo J Margolies S Sampath 2008 J Therm Spray Technol 17 1 82 90 10.1007/s11666-007-9151-3 2008JTST...17...82R
16. M Kagawa M Suzuki Y Mizoguchi T Hirai Y Syono 1993 J Aerosol Sci 24 3 349 355 10.1016/0021-8502(93)90007-V (Pubitemid 23668895)
17. KY Jung HW Lee 2007 J Lumin 126 2 469 474 10.1016/j.jlumin.2006.09.009 (Pubitemid 46755263)
18. YS Chung YC Kang SB Park 2004 J Electrochem Soc 151 8 H180 H183 10.1149/1.1764572
19. YC Kang IW Lenggoro SB Park K Okuyama 2000 Mater Res Bull 35 5 789 798 10.1016/S0025-5408(00)00257-9
20. J Marchal T John R Baranwal T Hinklin RM Laine 2004 Chem Mater 16 5 822 831 10.1021/cm021783l
21. JS Lee P Kumar S Gupta MH Oh MB Ranade RK Singh 2010 J Electrochem Soc 157 K25 10.1149/1.3262609
22. H Paul H Kaps T Gleich V Raeesi U Herr M Zachau 2007 Solid State Phenom 128 7 12 10.4028/www.scientific.net/SSP.128.7
23. O Fabrichnaya HJ Seifert T Ludwig F Aldinger A Navrotsky 2002 Scand J Metall 30 3 175 183 10.1034/j.1600-0692.2001.300308.x
24. BR Johnson WM Kriven 2001 J Mater Res 16 6 1796 10.1557/JMR.2001.0248 2001JMatR..16.1795J
25. RS Hay 1993 J Mater Res 8 3 578 604 10.1557/JMR.1993.0578 1993JMatR...8..578H
26. J Abell I Harris B Cockayne B Lent 1974 J Mater Sci 9 527 537 10.1007/BF02387524 1974JMatS...9..527A
27. Wilcox DC (2006) Turbulence modeling for CFD. DCW Industries Inc, La Canada, CA
28. WA Fiveland 1988 J Thermophys Heat Transfer 2 4 309 316 10.2514/3.105
29. JP Van Doormaal GD Raithby 1984 Numer Heat Transf A Appl 7 2 147 163 0553.76005 1984NHTA....7..147V
30. Liao F (2001) Thermal plasma chemical vapor deposition of silicon carbide films. Doctoral Dissertation, University of Minnesota, Minneapolis, MN, USA
31. Boulos MI, Fauchais P, Pfender E (1994) Thermal plasmas: fundamentals and applications. Springer, New York, p 468
32. P Auerkari 1996 Res Notes (Technical Research Centre of Finland) 1792 1 26
33. NJ Hess GD Maupin LA Chick DS Sunberg DE McCreedy TR Armstrong 1994 J Mater Sci 29 7 1873 1878 10.1007/BF00351307 1994JMatS..29.1873H
34. M Gervais SL Floch JC Rifflet J Coutures JP Coutures 2005 J Am Ceram Soc 75 11 3166 3168 10.1111/j.1151-2916.1992.tb04408.x
35. M Gervais SL Floch N Gautier D Massiot JP Coutures 1997 Mater Sci Eng B 45 1-3 108 113 10.1016/S0921-5107(96)02032-6
36. B Cockayne 1985 J Less Common Met 114 1 199 206 10.1016/0022-5088(85) 90402-3 1322095 (Pubitemid 16473778)
37. IC Lin A Navrotsky JKR Weber PC Nordine 1999 J Non-Cryst Solids 243 273 276 10.1016/S0022-3093(98)00814-X 1999JNCS..243..273L
38. G Blasse A Bril 1967 J Chem Phys 47 5139 10.1063/1.1701771 1967JChPh..47.5139B
39. Jakubith M (1991) Chemische Verfahrenstechnik. VCH, Weinheim