Poly(acrylic acid)-ferric hydroxide photosensitive self-assembly film

Materials Science Forum

Volumn 663-665, Issue , 2011, Pages 252-255

  Li, Xue Feng ^a   Peng, Shao Xian ^a  

^a HUBEI UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

AFM; Microtribology; Polymer matrix composite; Self assembly film

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBOXYLIC ACIDS; FRICTION; IRRADIATION; LIGHT SENSITIVE MATERIALS; MORPHOLOGY; OPTOELECTRONIC DEVICES; PHOTOSENSITIVITY; POLYELECTROLYTES; SELF ASSEMBLY; SOLS; SURFACE MORPHOLOGY; TRIBOLOGY; ULTRATHIN FILMS;

CATIONIC POLYELECTROLYTE; ELECTROSTATIC ATTRACTIONS; FRICTION FORCE MICROSCOPY; LAYER BY LAYER SELF ASSEMBLY; MICROTRIBOLOGY; SELF-ASSEMBLY FILMS; SELF-ASSEMBLY TECHNIQUE; THICKNESS OF THE FILM;

POLYMER MATRIX COMPOSITES;

EID: 78649937362     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.663-665.252     Document Type: Conference Paper

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