Implantation effects of ultra-thin Fe/Cr multilayers

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 2000, Pages 789-792

  Sakamoto, I ^a   Tanoue, H ^a   Koike, M ^a   Honda, S ^b   Nawate, M ^b   Shimizu, T ^b  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b SHIMANE UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROMAGNETIC COUPLING; CONVERSION ELECTRON MOSSBAUER SPECTROSCOPY; FE-IONS; FE/CR MULTILAYERS; INTERFACE STRUCTURES; ULTRA-THIN; VIBRATING SAMPLE MAGNETOMETER;

ANTIFERROMAGNETISM; ELECTRIC RESISTANCE; ION IMPLANTATION; IRON COMPOUNDS; MAGNETIC FIELD EFFECTS; MAGNETIC MULTILAYERS; MAGNETIC RECORDING; MAGNETIZATION; MOSSBAUER SPECTROSCOPY; STRUCTURAL PROPERTIES;

GIANT MAGNETORESISTANCE;

EID: 78649889083     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2000.924272     Document Type: Conference Paper

References (6)

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