Intense UV-visible photoluminescence from Si+ and N+ co-implanted thermal SiO2 films

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 2000, Pages 765-768

  Yu, Y H ^a   Li, L ^a   Lei, Y M ^a   Zhao, J ^a   Mao, D S ^a   Zou, S C ^a   Sundaraval, B ^b   Luo, E Z ^b   Wong, S P ^b   Xu, J B ^b   Wilson, I H ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON SPIN RESONANCE; IMPLANTED IONS; PL BANDS; ROOM TEMPERATURE; SI IONS; UV-VISIBLE;

ELECTRON SPIN RESONANCE SPECTROSCOPY; ION IMPLANTATION; PHOTOLUMINESCENCE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON COMPOUNDS; SPIN DYNAMICS;

SILICON;

EID: 78649876206     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2000.924266     Document Type: Conference Paper

References (5)

1. L. T. Canham. "Silicon quantum wire array fabrication by electrochemical and chemical dissolution of waters,"Appl. Phys. Lett 57, 1046(1990)
2. D. J. DiMaria, J. R. Kirtley, E. J. Pakulis, D. W. Dong, T. S. Kuan. F. L Pesavento, T. N. Theis, J. A. Culro, and S. D. Brorson. " Electroluminescence studies in silicon dioxide films containing tiny silicon islands.".). Appl. Phys. 56, 401 (1984)
3. 2 layers," Appl. Phys. Lett. 66, 851 (1995)
4. B. H. Augustine, E. A. Irene, Y. J. He, K. J. Price. L. E. McNeil, K. N. Christensen. and D. M Maher, "Visible light emission from thin films containing Si, O, N and H," J. Appl, Phys. 78,4020 (1995)
5. K. Oyoshi, T Tagami, S. Tanaka, "Formation of buried oxynitride layers in silica glass by ion implantation," J. Appl. Phys. 68, 3653 (1990)