Research of photolithography technology based on surface plasmon

Chinese Physics B

Volumn 19, Issue 11, 2010, Pages

  Li, Hai Hua ^a   Chen, Jian ^a   Wang, Qing Kang ^a  

^a Shanghai Jiao Tong University   (China)

Author keywords

Finite difference time domain; Lithography; Sub wavelength periodic structure; Surface plasmons

Indexed keywords

FINE PATTERN; FINITE DIFFERENCE TIME DOMAINS; GRATING STRUCTURES; NEW PROCESS; OPTICAL FIELD; PHOTOLITHOGRAPHY TECHNOLOGY; PHOTOSENSITIVE LAYERS; SEMICONDUCTOR PROCESS; SILICA STRUCTURES; SILVER FILM; SUB-WAVELENGTH; SURFACE PLASMONS;

FINITE DIFFERENCE TIME DOMAIN METHOD; METALLIC FILMS; OPTICAL DATA STORAGE; PHOTOLITHOGRAPHY; PLASMONS; SILICA; SILVER; SURFACE STRUCTURE;

PERIODIC STRUCTURES;

EID: 78649866531     PISSN: 16741056     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-1056/19/11/114203     Document Type: Article

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