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Volumn 7823, Issue PART 1, 2010, Pages
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Prospect of EUV mask repair technology using e-beam tool
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Author keywords
EB; Etching; EUV mask; Repair
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Indexed keywords
ABSORBER MATERIAL;
AFM;
CONVENTIONAL METHODS;
DEFECT SHAPES;
EB;
ETCHING GAS;
EUV BLANK;
EUV MASK;
INTRINSIC DAMAGE;
NEW PROCESS;
OPAQUE DEFECTS;
PATTERN SIZE;
PROCESS STABILITY;
REPAIR TOOLS;
SEM;
SIZE AND SHAPE;
TOPDOWN;
DEFECTS;
ETCHING;
EXPERIMENTS;
IMAGE RESOLUTION;
REPAIR;
PHOTOMASKS;
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EID: 78649864106
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.864288 Document Type: Conference Paper |
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Times cited : (11)
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References (4)
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