Embedded iron nano-clusters prepared by Fe ion implantation and GMR property

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 2000, Pages 781-784

  Hayashi, N ^a   Sakamoto, I ^b   Okada, T ^a   Tanoue, H ^b   Hirai, T ^c   Wakabayashi, H ^c   Toriyama, T ^c  

^a HOSEI UNIVERSITY   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

^c TOKYO CITY UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDES; CONVERSION ELECTRON MOSSBAUER SPECTROSCOPY; FE CLUSTERS; FE-IONS; FERROMAGNETIC STATE; FLUENCES; IMPLANTED IONS; ION ENERGIES; MAGNETIZATION MEASUREMENTS; MAGNETORESISTANCE RATIO; MOSSBAUER; NANOCRYSTALLINES;

ELECTRIC RESISTANCE; IRON COMPOUNDS; MAGNETIC FIELD EFFECTS; MAGNETIZATION; MAGNETOELECTRONICS; MAGNETORESISTANCE; MOSSBAUER SPECTROSCOPY;

ION IMPLANTATION;

EID: 78649831890     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2000.924270     Document Type: Conference Paper

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