Characterization of thin metal films processed at different temperatures

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1799-1804

  Siewenie, J E ^a   He, L ^a  

^a NORTHERN ILLINOIS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AL FILMS; GRAIN SIZE; LOW TEMPERATURES; ORDERS OF MAGNITUDE; PD FILM; ROOM TEMPERATURE; SUBSTRATE TEMPERATURE; TEM; THIN METAL FILMS; THIN METALS; VERY THIN FILMS;

ATOMIC FORCE MICROSCOPY; GOLD COATINGS; METALLIC FILMS; PALLADIUM; SILVER; SUBSTRATES; THICKNESS GAGES; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY;

GOLD;

EID: 78649773197     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581893     Document Type: Conference Paper

References (7)

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5. L. He, Z. Q. Shi, and W. A. Anderson, J. Electron. Mater. 22, 1285 (1994).
6. J. A. Venables, G. D. Spiller, and M. Hanbrucken, Rep. Prog. Phys. 47, 405 (1984).
7. D. Smith, Thin Film Deposition (McGraw-Hill, New York, 1995), p. 170.